Die 100 am häufigsten verwendeten Wörter in diesem Buch.
100
al
annealing
appl
applications
area
atoms
between
carrier
case
cell
channel
charge
circuit
concentration
crystal
current
defects
density
deposition
development
devices
different
diffusion
diode
doping
during
effect
electrical
electron
electronic
energy
example
field
fig
films
first
gaas
gate
grain
growth
high
higher
however
hydrogen
implantation
impurities
increase
ion
junction
layer
level
low
lower
material
may
metal
methods
new
nm
order
oxide
phys
possible
potential
power
pp
process
properties
range
rate
region
research
results
rev
semiconductor
shown
shows
si
silicon
size
solid
state
structure
substrate
surface
systems
techniques
technology
temperature
therefore
thermal
thin
time
transistor
two
used
values
voltage
wafer